By Bharat Bhushan, Harald Fuchs
From the reviews:
"Vol. XI comprises contributions approximately contemporary advancements in scanning probe microscopy suggestions. … The editors and their gifted authors were one of the leaders within the examine of probe equipment. … every one bankruptcy captures either the buzz and the significance of the paintings and conclusions mentioned, and may make ecocnomic studying for researchers in any respect adventure degrees. … the entire chapters are supported through broad lists of references and wonderfully illustrated and in colour too, additionally in addition to graphs, equations etc." (Current Engineering perform, 2009)“The articles … are written in adequate aspect, in order that collage scholars, researchers and engineers can comprehend the physics of the tools, the layout and building of the units and the cantilevers, the sign processing algorithms, and their use in imaging and the outside characterization of the specimens. … SPM features a number of strategies, together with scanning near-field optical microscopy, which has fascinating functions … . well-written and obviously illustrated. … comprise abundant experimental facts and demanding dialogue of boundaries and artifacts.” (Barry R. Masters, Optics & Photonics information, September, 2009)
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Additional info for Applied Scanning Probe Methods XI: Scanning Probe Microscopy Techniques
347 Automated AFM as an Industrial Process Metrology Tool for Nanoelectronic Manufacturing Tianming Bao, David Fong, Sean Hand . . . . . . . . it. M. es XLVI List of Contributors – Volume XI Dmytro S. de Mykhaylo Evstigneev Fakult¨at f¨ur Physik, Universit¨at Bielefeld, Universit¨atsstr. De Harald Fuchs Physikalisches Institut and Center for Nanotechnology (CeNTech), Universit¨at M¨unster, Wilhelm-Klemm-Str. de Donna C. gov Johann Jersch Physikalisches Institut, Universit¨at M¨unster, Wilhelm-Klemm-Str.
5. Scheme of the oscillation controller developed on the μP ATMEGA base. On the right image the electronic designed on a 4-layer printed board, with dimensions 70 × 30 mm2 , is shown in this development is a current source drive discussed in detail in , the other is the possibility of phase modulation mode . On the input we use wideband, lownoise JFET operational amplifiers OPA657 or AD8067, providing high performance with any QCR up to 10-MHz resonance frequency. Other main IC’s: the ADC is an AD7680, VCA – AD 8337.
309 36 XLIV 37 38 Contents – Volume X Applications to Nano-Dispersion Macromolecule Material Evaluation in an Electrophotographic Printer Yasushi Kadota . . . . . . . . . . . . . . 347 Automated AFM as an Industrial Process Metrology Tool for Nanoelectronic Manufacturing Tianming Bao, David Fong, Sean Hand . . . . . . . . it. M. es XLVI List of Contributors – Volume XI Dmytro S. de Mykhaylo Evstigneev Fakult¨at f¨ur Physik, Universit¨at Bielefeld, Universit¨atsstr.