By Gan Fuxi, Wang Yang
In the large information period, info garage is without doubt one of the cores within the complete details chain, such as construction, move, sharing, and at last processing. through the years, the expansion of information quantity has been explosive. at the present time, a variety of garage prone desire thoughts with better density and capability. furthermore, details garage within the massive facts functions might be eco-friendly, secure, and lengthy lifestyles. The garage density of thoughts used to be mostly superior in recent times end result of the quick improvement of nanotechnology. The minimal function measurement of optical, magnetic, and electric stories is already on the nanometer scale. in addition, the interdisciplinary cooperation of nanotechnology can facilitate the advance of knowledge garage know-how to accomplish better operation velocity, reduce energy intake, and elevated retention time. This e-book compiles the state-of-the-art study growth of nanometer-scale information garage. the most themes lined comprise optical reminiscence, random entry reminiscence, magnetic reminiscence, and hybrid reminiscence. The textual content emphasizes simpler equipment for info garage improvement and purposes.
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Additional resources for Data storage at the nanoscale : advances and applications
The values r and u are simplified radial and axial coordinates, respectively. 3) where R and Z are the genuine radial and axial coordinates. NA is the numerical aperture of the objective lens. The phase of each belt on the pupil plane is fj, ( j = 1, 2, …, n), and the radius for each belt is rj, ( j = 1, 2, …, n), and rj – 1 < rj < rj = 1. For a three-belt pure phase apodizer, r1 = b, r2 = a, r3 = 1, the axial optimization process can be achieved by solving a secondorder differential equation of the axial intensity curve 2 I(0, u) = 0.
Generally speaking, in the light far field, the limit size is only the half light wavelength. Therefore, the critical problem is optical diffraction limit: D l/NA, as shown in Fig. 6. For breakping through the diffraction barrier in the light far field, several super-resolution approaches have been proposed . 6 Schematic diagram of diffraction limit in light far field. 81. EUV light can come from the laser-produced plasma (LPP): Tin(Sn) drop irradiated by high power CO2 laser. It is easy to get 22 nm line space by EUV lithography.
For example, the axial intensity (as shown in Fig. 59l, the beam size is about 9% smaller than the diffraction limit. The image of the beam in the focal region before and after using the binary apodizer is shown in Fig. 6, it is clear that for the original system, the beam diverges rapidly away from the focal plane, while for the system with binary apodizer, the beam does not diverge within 5 wavelength range. 2 Generation of Super-Resolution Longitudinally Polarized Light Beam with Binary Optics Recently, it has been demonstrated that focusing of radially polarized light by using a ring aperture to obstruct the center part of the incident beam can result in smallest light spot achievable in free space,  due to the suppression of the radial field component contributed by the lower aperture field, which effectively reduces the cross-polarization effect.